Presentations
Molecular Nanotechnology Research Overview Tutorial (Audio), U.S. Naval Surface Warfare Center As presented by David Forrest, U.S. Naval Surface Warfare Center at the 13th Foresight Conference: Advancing Beneficial Nanotechnology: Focusing on the Cutting Edge, …
The Foresight Nanotechnology Challenges (Slides), Foresight Nanotech Institute As presented by Scott Mize, President, Foresight Nanotech Institute at the 13th Foresight Conference: Advancing Beneficial Nanotechnology: Focusing on …
Molecular Nanotechnology Research Overview Tutorial (Slides), U.S. Naval Surface Warfare Center As presented by David Forrest, U.S. Naval Surface Warfare Center at the 13th Foresight Conference: Advancing Beneficial Nanotechnology: Focusing on the Cutting Edge, …
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Featured Downloads
Improved Oxide Growth Rate and Uniformity through New Steam Delivery Method, RASIRC Oxidation of silicon is a common and frequent step in the manufacture of integrated circuits (IC). The success or failure of the IC manufacturer …
The Value of EH&S in Nanotechnology Businesses, Altairnano, Inc. This short paper answers the question "what is nanotechnology?" and presents a short nanotechnology history, why and how it is used, some of the concerns, …
Optical Switching Applications using PbSe IR-Evidot Nanocrystals, Evident Technologies We live in the information age where computing and data transport is based upon aging silicon technology. Scientists are starting to unlock the …
Rogue Valley Microdevices Purchases RASIRC Steamer, RASIRC In the summer of 2006, RASIRC® announced that Rogue Valley Microdevices had purchased four RASIRC Steamers to install in its facility in …
Silicon Design Chain Cooperation Enables Nanometer Chip Design, Cadence Shrinking process technology nodes, increasing chip complexity, more complicated design verification tasks, and shorter times-to-market have …
Urea and Ammonia Removal from De-Ionized Water via Steam Purification, RASIRC De-Ionized (DI) water is ubiquitous within the Fab. Purity and consistency of DI is critical to manufacturing process. Urea is a known contaminant that is difficult …
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